Semiconductors & Chipmaking · Recorded milestone
High-k metal gate transistors
Recorded year2007
Intel's 45 nm Penryn chips swap the silicon dioxide gate insulator for hafnium oxide, stopping current leaking through thin gates.
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- CMOS logicRecorded · 1963enables
Led to
Sources & evidence
Dataset updated 2026-10-18. This individual record has not been separately re-reviewed.